The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2020

Filed:

Jun. 06, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Jing Sha, White Plains, NY (US);

Michael A. Guillorn, Cold Springs, NY (US);

Derren N. Dunn, Sandy Hook, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06N 3/08 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06N 3/08 (2013.01); G06F 2217/02 (2013.01);
Abstract

A method is presented for generating a plurality of physical design layout patterns. The method includes selecting one or more physical design layouts for neural network training, converting the plurality of physical design layout patterns into coordinate arrays, a coordinate array of the coordinate arrays including via center coordinates of vias in a physical design layout pattern of the plurality of physical design layout patterns, training, by employing the coordinate arrays, a variational autoencoder (VAE), and generating one or more new synthetic coordinate arrays by employing the trained VAE, a synthetic coordinate array of the one or more new synthetic coordinate arrays including via center coordinates of vias for a new physical design layout pattern.


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