The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2020

Filed:

Nov. 29, 2017
Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Alexander Voronov, Yongin-si, KR;

Gyoo Wan Han, Yongin-si, KR;

Ku Hyun Kang, Yongin-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Yongin-si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 26/03 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); B23K 26/359 (2014.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); B23K 26/032 (2013.01); B23K 26/359 (2015.10); G01N 2021/9513 (2013.01);
Abstract

A patterning apparatus includes a laser generator, at least one lens, a detector, and a controller. The laser generator generates a first laser beam and a second laser beam having different intensities. The at least one lens irradiates the first laser beam to form a pattern in a substrate, irradiates a second laser beam to determine a defect of the pattern, and condenses reflected beams generated as the second laser beam is reflected from the substrate. The detector converts the reflected beams to electrical signals. The controller determines a defect of the pattern based on the electrical signals.


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