The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2020

Filed:

Nov. 15, 2013
Applicant:

Landmark Graphics Corporation, Houston, TX (US);

Inventors:

Andrey Filippov, Houston, TX (US);

Jianxin Lu, Bellaire, TX (US);

Vitaly Khoriakov, Calgary, CA;

Assignee:

LANDMARK GRAPHICS CORPORATION, Houston, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E21B 43/25 (2006.01); E21B 41/00 (2006.01); E21B 43/16 (2006.01); E21B 43/20 (2006.01); E21B 47/06 (2012.01); G01F 1/00 (2006.01); G01F 1/74 (2006.01);
U.S. Cl.
CPC ...
E21B 41/0092 (2013.01); E21B 43/16 (2013.01); E21B 43/20 (2013.01); E21B 47/06 (2013.01); G01F 1/00 (2013.01); E21B 43/255 (2013.01); G01F 1/74 (2013.01);
Abstract

The disclosed embodiments include a method, apparatus, and computer program product for determining optimal flow control device (FCD) properties that would yield to a prescribed shape of the injection flow rate profile. For example, in one embodiment, a computer implemented method is configured to perform the steps of: determining a reference location along a production length of the injection well; determining a reference value equal to the injection flow rate profile at the reference location along the production length of the injection well; defining a target injection profile using the reference value; determining a pressure distribution along the production length of the injection well based on the target injection profile; determining a FCD distribution profile using the target injection profile and the pressure distribution; and determining FCD properties that yields the target injection profile based on the FCD distribution profile.


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