The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 14, 2020

Filed:

Nov. 18, 2016
Applicant:

Safran Ceramics, Le Haillan, FR;

Inventors:

Emilien Buet, Saint Medard en Jalles, FR;

Simon Thibaud, Pessac, FR;

Adrien Delcamp, Merignac, FR;

Cédric Descamps, Eysines, FR;

Assignee:

SAFRAN CERAMICS, Le Haillan, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/54 (2006.01); C23C 16/34 (2006.01); C23C 14/56 (2006.01); D06M 11/58 (2006.01); D06B 3/04 (2006.01); D06M 101/40 (2006.01);
U.S. Cl.
CPC ...
D06M 11/58 (2013.01); C23C 16/342 (2013.01); C23C 16/4412 (2013.01); C23C 16/45502 (2013.01); C23C 16/545 (2013.01); D06B 3/045 (2013.01); C23C 14/562 (2013.01); C23C 16/45563 (2013.01); D06M 2101/40 (2013.01); D10B 2101/08 (2013.01); D10B 2101/12 (2013.01); D10B 2101/16 (2013.01);
Abstract

A device for coating one or more yarns by a vapor deposition method, the device including a treatment chamber extending along a longitudinal axis and having a treatment zone between an internal and an external circumferential wall, and within which at least one yarn is to be coated by performing a vapor deposition method; a conveyor system to transport the at least one yarn through the treatment zone; an injector device to inject a treatment gas phase into the treatment zone through an inlet orifice present in the internal or external circumferential wall; and a removal device to remove the residual gas phase from the treatment zone through an outlet orifice present in the internal or external circumferential wall, the inlet and the outlet orifice being situated in a common plane perpendicular to the longitudinal axis of the chamber and being offset around the circumferential direction of the chamber.


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