The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Jul. 20, 2017
Applicants:
Triratna P. Muneshwar, Edmonton, CA;
Ken Cadien, Edmonton, CA;
Inventors:
Triratna P. Muneshwar, Edmonton, CA;
Ken Cadien, Edmonton, CA;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/52 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01); C23C 16/448 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45536 (2013.01); C23C 16/4482 (2013.01); C23C 16/45525 (2013.01); C23C 16/45546 (2013.01); C23C 16/45553 (2013.01); C23C 16/45593 (2013.01); C23C 16/52 (2013.01); H01L 21/0228 (2013.01); H01L 21/28556 (2013.01);
Abstract
A method and system is provided to improve precursor utilization in pulsed atomic layer processes. The system integrates a chiller with a precursor ampoule to lower the temperature of the precursor ampoule, and thereby reduce the precursor vapor pressure. By lowering the ampoule temperature, the loss of excess unreacted precursor molecules is reduced, in order to improve precursor utilization efficiency in atomic layer processes.
Muneshwar, Triratna. (2020). Method to improve precursor utilization in pulsed atomic layer processes (U.S. Patent No. 10619243). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10619243
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile