The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2020
Filed:
Sep. 21, 2017
Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Wuhan, CN;
Gaozhen Wang, Shenzhen, CN;
Abstract
Embodiments of the present disclosure provide a gas diffusion device and a film-forming apparatus. The gas diffusion device includes a cover plate, a first diffusion part and a second diffusion part. The first diffusion part cooperates with the cover plate to define a first diffusion space and a gas inlet that communicates with the first diffusion space. The second diffusion part cooperates with the cover plate to define a second diffusion space and a gas outlet that communicates with the second diffusion space. The second diffusion space communicates with the first diffusion space. In a direction from the gas inlet to the gas outlet, a gas between the first diffusion part and the cover plate decreases in height gradually, and a gap between the second diffusion part and the cover plate increases in height gradually at first and then decreases in height gradually.