The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2020

Filed:

Apr. 10, 2015
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventors:

Tatsufumi Aoi, Tokyo, JP;

Kengo Yamaguchi, Tokyo, JP;

Ryuichi Matsuda, Tokyo, JP;

Akio Ikeda, Tokyo, JP;

Hirofumi Shimizu, Tokyo, JP;

Takuya Yamazaki, Tokyo, JP;

Tatsuya Kimura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); H05H 1/54 (2006.01); H05H 1/00 (2006.01); F03H 1/00 (2006.01); G01N 21/71 (2006.01); G01R 29/24 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); F03H 1/0037 (2013.01); F03H 1/0081 (2013.01); G01N 21/718 (2013.01); G01R 29/24 (2013.01); H05H 1/0037 (2013.01); H05H 1/54 (2013.01); H05H 2001/4645 (2013.01);
Abstract

A plasma generation apparatus, and a plasma thruster configured to use the plasma generation apparatus are disclosed. The plasma generation apparatus includes a discharge vessel, a light-emitting monitor, a probe measuring instrument, a control device, and an optical axis driving unit. The discharge vessel is configured to ionize gas which is introduced to an inside thereof so as to generate plasma. The light-emitting monitor is configured to measure electron density of the plasma by emission spectra of the plasma. The probe measuring instrument is configured to measure the electron density of the plasma by a probe in the discharge vessel.


Find Patent Forward Citations

Loading…