The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Aug. 30, 2019
International Business Machines Corporation, Armonk, NY (US);
Globalfoundries Inc., Grand Cayman, KY;
Lam Research Corporation, Fremont, CA (US);
Georges Jacobi, Malta, NY (US);
Vimal K. Kamineni, Mechanicville, NY (US);
Randolph F. Knarr, Voorheesville, NY (US);
Balasubramanian Pranatharthiharan, Watervliet, NY (US);
Muthumanickam Sankarapandian, Niskayuna, NY (US);
International Business Machines Corporation, Armonk, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
LAM RESEARCH CORPORATION, Fremont, CA (US);
Abstract
After forming a material stack including a gate dielectric, a work function metal and a cobalt gate electrode in a gate cavity formed by removing a sacrificial gate structure, the cobalt gate electrode is recessed by oxidizing the cobalt gate electrode to provide a cobalt oxide layer on a surface of the cobalt gate electrodes and removing the cobalt oxide layer from the surface of the cobalt gate electrodes by a chemical wet etch. The oxidation and oxide removal steps can be repeated until the cobalt gate electrode is recessed to any desired thickness. The work function metal can be recessed after the recessing of the cobalt gate electrode is completed or during the recessing of the cobalt gate electrode.