The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Mar. 02, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Ludovic Godet, Sunnyvale, CA (US);
Christine Y. Ouyang, Santa Clara, CA (US);
Viachslav Babayan, Sunnyvale, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 5/00 (2006.01); H01L 21/67 (2006.01); H01L 21/027 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); H01L 21/0273 (2013.01); H01L 21/67103 (2013.01); H01L 21/67126 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 21/6838 (2013.01); H01L 21/68785 (2013.01);
Abstract
A process chamber having moveable electrodes for generating a parallel field within a process volume filled with a fluid is provided. In one implementation, a major axis of the process chamber is oriented vertically and a substrate support is disposed opposite a plurality of moveable electrodes extending along the major axis of the process chamber. In certain implementations, the substrate support is electrically floating and capable of rotating about a minor axis of the process chamber during processing of a substrate.