The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2020

Filed:

May. 20, 2016
Applicant:

Korea Research Institute of Standards and Science, Daejeon, KR;

Inventors:

Takashi Ogawa, Daejeon, KR;

Ju Hwang Kim, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/05 (2006.01); G01N 23/2251 (2018.01); H01J 37/26 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/05 (2013.01); G01N 23/2251 (2013.01); H01J 37/26 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/2802 (2013.01);
Abstract

The present invention relates to an electron beam apparatus including a monochromator in which cylindrical electrostatic lenses for deflecting a path of an electron beam in the lenses are arranged symmetrically and an aperture including a plurality of selectable slits is disposed therebetween to be able to select an electron beam having a specified energy range. The electron beam apparatus has a monochromator having high resolution and excellent stability and maintainability by disposing slits and circular openings in one aperture part in parallel arrangement, thereby improving spatial resolution and energy resolution.


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