The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2020

Filed:

Mar. 11, 2016
Applicant:

AZ Electronic Materials (Luxembourg) S.Ă  R.l., Luxembourg, LU;

Inventor:

John Cleaon Moore, Camarillo, CA (US);

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/50 (2006.01); G03F 7/42 (2006.01); C09D 5/20 (2006.01); C11D 3/20 (2006.01); C11D 3/43 (2006.01); C11D 11/00 (2006.01); C23G 1/06 (2006.01); C23G 1/10 (2006.01); C23G 5/032 (2006.01);
U.S. Cl.
CPC ...
G03F 7/426 (2013.01); C09D 5/20 (2013.01); C11D 3/2075 (2013.01); C11D 3/43 (2013.01); C11D 11/0047 (2013.01); C23G 1/06 (2013.01); C23G 1/103 (2013.01); C23G 5/032 (2013.01);
Abstract

The present invention is a charge complexing chemical composition that protects metal during polymer removal. The polymer coatings include crosslinked systems by chemical-amplification and photoacid generated (PAG) means as in epoxies. The system includes a solvent, a charge complexing additive, and an acid that creates a protective complex for sensitive metals during the dissolving and rinsing practice needed for processing microelectronic parts. The composition can be utilized with a method for removing partial and fully cured crosslinked coatings that originate from chemical amplification or PAG-epoxy photoimageable coatings.


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