The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Jan. 24, 2018
Rodenstock Gmbh, Munich, DE;
Stephan Trumm, Munich, DE;
Wolfgang Becken, Neuried, DE;
Helmut Altheimer, Baisweil-Lauchdorf, DE;
Adam Muschielok, Munich, DE;
Yohann Bénard, Munich, DE;
Gregor Esser, Munich, DE;
Anne Seidemann, Munich, DE;
Werner Mueller, Oetisheim, DE;
Rodenstock GmbH, Munich, DE;
Abstract
Optimizing and producing a lens by defining an individual eye model, in which a shape of a corneal front surface of a model eye, and a reference aberration at an evaluation surface within the model eye are defined based on individual measurement values for the lens wearer's eye, on standard values, or based on provided individual refraction data; specifying first and second surfaces for the lens to be optimized; determining the path of a main ray through a visual point a surface of the lens into the model eye up to the evaluation surface; evaluating an aberration of a wavefront propagating along the main ray and resulting from a spherical wavefront incident on the first surface of the lens at the evaluation surface in comparison to the reference aberration; and iteratively varying the surface of the lens until the evaluated aberration corresponds to a predetermined target aberration.