The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Sep. 21, 2018
Korea University Research and Business Foundation, Seoul, KR;
Abstract
Disclosed is a method for focusing light to a target object within scattering medium comprising the following steps: (a) illuminating a plurality of incidence beams having different incidence patterns from each other, and obtaining reflection beams which are reflected from the target object for each incidence beams by a flight time which is a arrival time of the reflection beam to a camera; (b) forming a time-gated reflection matrix using the plurality of the incidence beams and the plurality of the reflection beams; (c) applying the time-gated reflection matrix to Single Value Decomposition such that a time-gated eigenchannel corresponding to a depth of the target object is calculated; (d) illuminating an eigen incidence beam having an incidence pattern, to which the time-gated eigenchannel is applied, to the target object.