The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2020

Filed:

Jun. 06, 2017
Applicants:

Anna Nikolaevna Ivanovskaya, Mountain View, CA (US);

Vanessa Tolosa, Oakland, CA (US);

Dylan Dahlquist, Folsom, CA (US);

Satinderpall S. Pannu, Pleasanton, CA (US);

Kedar G. Shah, San Francisco, CA (US);

Angela C. Tooker, Dublin, CA (US);

Fang Qian, Santa Cruz, CA (US);

Inventors:

Anna Nikolaevna Ivanovskaya, Mountain View, CA (US);

Vanessa Tolosa, Oakland, CA (US);

Dylan Dahlquist, Folsom, CA (US);

Satinderpall S. Pannu, Pleasanton, CA (US);

Kedar G. Shah, San Francisco, CA (US);

Angela C. Tooker, Dublin, CA (US);

Fang Qian, Santa Cruz, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F 3/14 (2006.01); C25F 3/02 (2006.01); C25F 7/00 (2006.01);
U.S. Cl.
CPC ...
C25F 3/14 (2013.01); C25F 3/02 (2013.01); C25F 7/00 (2013.01);
Abstract

The present invention relates to surface roughening methods and more particularly to a method for electrochemical roughening of thin film macro- and micro-electrodes. In one embodiment, an electrochemical etch template is formed comprising polymer particles adsorbed on a surface of a substrate to be roughened, followed by electrochemically etching of exposed regions of the substrate between the polymer particles in the electrochemical etch template so as to selectively roughen the surface of the substrate. In another embodiment, a surface of the electrode is immersed in either a adsorbing acidic solution, such as sulfuric acid, or a non-adsorbing acidic solution, such as perchloric acid, followed by electrochemically pulse etching the surface of the substrate at a narrow frequency range for adsorbing acidic solutions, or at a wide frequency range for non-adsorbing acidic solutions.


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