The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Jun. 16, 2017
Applicant:
Lawrence Livermore National Security, Llc, Livermore, CA (US);
Inventor:
Eyal Feigenbaum, Livermore, CA (US);
Assignee:
Lawrence Livermore National Security, LLC, Livermore, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/16 (2006.01); C23F 1/00 (2006.01); C23F 1/44 (2006.01); G02B 1/00 (2006.01); G02B 3/00 (2006.01); H01L 21/263 (2006.01); H01L 21/306 (2006.01); H01L 21/3065 (2006.01); H01L 21/3105 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C23F 1/00 (2013.01); B41J 2/1626 (2013.01); B41J 2/1628 (2013.01); B41J 2/1629 (2013.01); C23F 1/44 (2013.01); G02B 1/00 (2013.01); H01L 21/2633 (2013.01); H01L 21/3065 (2013.01); H01L 21/30608 (2013.01); H01L 21/31056 (2013.01); H01L 21/76808 (2013.01);
Abstract
The present disclosure relates to a method for creating an optical component having a spatially controlled refractive index. The method may involve applying a thin metal material layer to a substrate. The thin metal material layer may then be heated to create a mask having a spatially varying nano-particle distribution. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate.