The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Jun. 22, 2017
Corning Incorporated, Corning, NY (US);
Sarko Cherekdjian, Campbell, CA (US);
Benedict Osobomen Egboiyi, Painted Post, NY (US);
William Brashear Mattingly, III, Painted Post, NY (US);
Michael Yoshiya Nishimoto, Horseheads, NY (US);
Toshihiko Ono, Shizuoka, JP;
Prakash Chandra Panda, Ithaca, NY (US);
Trevor Edward Wilantewicz, Sunnyvale, CA (US);
CORNING INCORPORATED, Corning, NY (US);
Abstract
Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.