The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2020

Filed:

Dec. 01, 2017
Applicant:

Osram Opto Semiconductors Gmbh, Regensburg, DE;

Inventors:

Martin Lemberger, Neunkirchen, DE;

Michael Schmal, Schmiduehlen, DE;

Julian Ikonomov, Neutraubling, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/22 (2006.01); C23C 14/50 (2006.01); H01L 31/0224 (2006.01); H01L 31/0232 (2014.01); H01L 31/0352 (2006.01); H01L 33/20 (2010.01); H01L 33/38 (2010.01); H01L 33/46 (2010.01);
U.S. Cl.
CPC ...
C23C 14/225 (2013.01); C23C 14/505 (2013.01); H01L 31/02327 (2013.01); H01L 31/022408 (2013.01); H01L 31/035281 (2013.01); H01L 33/20 (2013.01); H01L 33/38 (2013.01); H01L 33/46 (2013.01); H01L 2933/0025 (2013.01);
Abstract

What is specified is a method for producing a coating comprising the following steps: —providing a material source having a top surface and a main coating direction, —providing a substrate holder having a top surface, —providing at least one base layer, having a coating surface remote from the substrate holder, on the top surface of the substrate, —attaching the substrate holder to a rotating arm, which has a length along a main direction of extent of the rotating arm, —setting the length of the rotating arm in such a manner that a normal angle (φ) throughout the method is at least 30° and at most 75°, —applying at least one coating to that side of the base layer which has the coating surface by means of the material source, wherein—during the coating process with the coating, the substrate holder is rotated about a substrate axis of rotation running along the main direction of extent of the rotating arm.


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