logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10611084 B1

PDFFull Text
Expired
Date of Patent:
Apr. 07, 2020

Filed:

May. 10, 2017

Reflector and additive manufacturing system

Applicant:

Hewlett-packard Development Company, L.p., Houston, TX (US);

Inventors:

Alejandro Manuel de Pena, Sant Cugat del Valles, ES;

Ferran Esquius Berengueras, Sant Cugat del Valles, ES;

Esteve Comas, Sant Cugat del Valles, ES;

Arthur H. Barnes, Vancouver, WA (US);

Assignee:

Hewlett-Packard Development Company, L.P., Spring, TX (US);

Attorney:

HP Inc. Patent Department

Primary Examiner:

Vip Patel

Int. Cl.
CPC ...
F21V 21/00 (2006.01); B29C 64/282 (2017.01); B33Y 30/00 (2015.01); B29C 64/295 (2017.01); B29C 35/08 (2006.01); B29C 64/209 (2017.01); B29C 64/165 (2017.01); B29L 11/00 (2006.01); B33Y 10/00 (2015.01);
U.S. Cl.
CPC ...
B29C 64/282 (2017.08); B29C 35/0805 (2013.01); B29C 64/165 (2017.08); B29C 64/209 (2017.08); B29C 64/295 (2017.08); B33Y 30/00 (2014.12); B29C 2035/0822 (2013.01); B29L 2011/0083 (2013.01); B33Y 10/00 (2014.12);
Abstract

A reflector includes a first reflector section and a second reflector section. The first reflector section extends along a portion of a first ellipse. The second reflector section extends along a portion of a second ellipse, the second ellipse intersecting the first ellipse. The first reflector section and the second reflector section are joined at an intersecting point of the first ellipse and the second ellipse.

Find Patent Forward Citations

de Pena, Alejandro. (2020). Reflector and additive manufacturing system (U.S. Patent No. 10611084). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10611084

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…