The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Jun. 26, 2017
Applicant:
Fujitsu Ten Limited, Kobe-shi, JP;
Inventors:
Hisaki Hayashi, Kobe, JP;
Yasuyuki Watanabe, Kobe, JP;
Assignee:
FUJITSU TEN LIMITED, Kobe-Shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
B23K 3/08 (2006.01); B05B 7/04 (2006.01); B23K 1/00 (2006.01); B23K 1/20 (2006.01); B23K 101/42 (2006.01);
U.S. Cl.
CPC ...
B23K 3/082 (2013.01); B05B 7/04 (2013.01); B23K 1/0016 (2013.01); B23K 1/203 (2013.01); B23K 2101/42 (2018.08);
Abstract
There is provided a flux applying method using a flux applying apparatus configured to jet and apply a flux to a target. The flux is supplied to a nozzle of the flux applying apparatus. A gas is applied to a foaming pipe with a porous filter included in the nozzle. The gas is jetted from the porous filter of the foaming pipe to the flux supplied to the nozzle, thereby jetting foamed flux to the target.