The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Mar. 25, 2015
Applicant:
National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);
Inventor:
Eric N. Coker, Albuquerque, NM (US);
Assignee:
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 5/18 (2006.01); B01D 53/22 (2006.01); B01D 71/02 (2006.01); B29C 67/20 (2006.01); B01D 67/00 (2006.01); B29C 44/56 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
B01D 53/228 (2013.01); B01D 67/0051 (2013.01); B01D 67/0083 (2013.01); B01D 67/0086 (2013.01); B01D 71/028 (2013.01); B29C 44/56 (2013.01); B29C 67/202 (2013.01); B82Y 30/00 (2013.01); B01D 2325/022 (2013.01); Y10T 428/24997 (2015.04); Y10T 428/249969 (2015.04); Y10T 428/249978 (2015.04);
Abstract
As asymmetric porous film structure formed by depositing a porous material film on a flexible substrate, and applying an anisotropic stress to the porous media on the flexible substrate, where the anisotropic stress results from a stress such as an applied mechanical force, a thermal gradient, and an applied voltage, to form an asymmetric porous material.