The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Nov. 24, 2015
Applicant:

Hitachi Chemical Company, Ltd., Tokyo, JP;

Inventor:

Nobuyuki Yoshida, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 18/38 (2006.01); H05K 3/40 (2006.01); C25D 21/12 (2006.01); C25D 7/00 (2006.01); C23C 18/16 (2006.01); H05K 3/42 (2006.01); C25D 5/18 (2006.01); C23C 18/30 (2006.01); H05K 3/00 (2006.01); H05K 3/46 (2006.01); C25D 3/38 (2006.01);
U.S. Cl.
CPC ...
H05K 3/4076 (2013.01); C23C 18/1653 (2013.01); C23C 18/30 (2013.01); C23C 18/38 (2013.01); C25D 5/18 (2013.01); C25D 7/00 (2013.01); C25D 21/12 (2013.01); H05K 3/0026 (2013.01); H05K 3/423 (2013.01); H05K 3/4644 (2013.01); C25D 3/38 (2013.01); H05K 3/0038 (2013.01); H05K 3/427 (2013.01); H05K 2203/0723 (2013.01); H05K 2203/107 (2013.01); H05K 2203/1476 (2013.01);
Abstract

A method for manufacturing a multilayer wiring board includes a step (1) and a step (2). The step (1) disposes a hole for through-hole, a squirt of metal foils, and a lower space. The squirt of the metal foils on both the sides of the insulating layer is formed at an opening of the hole for through-hole. The lower space is formed between the squirt of the metal foils and an inner wall of the hole for through-hole. The step (2) plugs up the hole for through-hole by forming an electrolytic filled plating layer at an inside of the hole for through-hole and on the metal foils on both the sides of the insulating layer. The plugging of the hole for through-hole in the step (2) is performed by once decreasing a current density of an electrolytic filled plating in a middle of the electrolytic filled plating and then increasing the current density again.


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