The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

May. 03, 2019
Applicant:

Qorvo Us, Inc., Greensboro, NC (US);

Inventors:

Daniel Charles Kerr, Oak Ridge, NC (US);

Jinsung Choi, Greensboro, NC (US);

Baker Scott, San Jose, CA (US);

George Maxim, Saratoga, CA (US);

Hideya Oshima, Santa Clara, CA (US);

Assignee:

Qorvo US. Inc., Greensboro, NC (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03K 17/041 (2006.01); H03K 17/16 (2006.01); H03K 17/10 (2006.01); H03K 17/693 (2006.01); H04B 1/44 (2006.01);
U.S. Cl.
CPC ...
H03K 17/04106 (2013.01);
Abstract

A transistor-based radio frequency (RF) switch that provides symmetric RF impedance is disclosed. The transistor-based RF switch includes an N number of main field-effect transistors (FETs) stacked in series between a first end node and a second end node. A first end-network is coupled between the first end node and a proximal gate node. The first end-network provides a first variable impedance that equalizes a drain-to-source voltage of the first main FET to within a predetermined percentage of a drain-to-source voltage of a second main FET of the N number of main FETs. A second end-network is coupled between the second end node and the distal gate node, wherein the second end-network provides a second variable impedance to equalize the drain-to-source voltage of an Nth main FET to within the predetermined percentage of the drain-to-source voltage of an N−1 main FET of the N number of main FETs.


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