The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Nov. 15, 2016
Applicants:

Christopher F. Kirby, Gambrills, MD (US);

Michael Rennie, Mechanicsville, VA (US);

Daniel J. O'donnell, Manassas, MD (US);

Inventors:

Christopher F. Kirby, Gambrills, MD (US);

Michael Rennie, Mechanicsville, VA (US);

Daniel J. O'Donnell, Manassas, MD (US);

Assignee:

NORTHROP GRUMMAN SYSTEMS CORPORATION, Falls Church, VA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 39/24 (2006.01); H01L 39/02 (2006.01); H01L 39/12 (2006.01);
U.S. Cl.
CPC ...
H01L 39/2493 (2013.01); H01L 39/025 (2013.01); H01L 39/12 (2013.01); H01L 39/2406 (2013.01);
Abstract

A method of forming a superconductor device structure is disclosed. The method comprises forming a base electrode in a first dielectric layer, forming a junction material stack over the base electrode, forming a hardmask over the junction material stack, etching away a portion of the junction material stack to form a Josephson junction (JJ) over the base electrode, and depositing a second dielectric layer over the hardmask, the JJ, the base electrode and the first dielectric layer. The method additionally comprises forming a first contact through the second dielectric layer to the base electrode to electrically couple the first contact to a first end of the JJ, and forming a second contact through the second dielectric layer and the hardmask to electrically coupled the second contact to a second end of the JJ.


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