The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Jun. 26, 2018
Applicant:

Lg Display Co., Ltd., Seoul, KR;

Inventors:

HeeSung Lee, Incheon, KR;

SungKi Kim, Seoul, KR;

MinCheol Kim, Paju-si, KR;

SeungJin Kim, Paju-si, KR;

JeeHo Park, Seoul, KR;

Seoyeon Im, Paju-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); G02F 1/1335 (2006.01); G02F 1/1343 (2006.01); G02F 1/1368 (2006.01); H01L 27/12 (2006.01); H01L 27/32 (2006.01); H01L 29/66 (2006.01); G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7869 (2013.01); G02F 1/1368 (2013.01); G02F 1/133514 (2013.01); G02F 1/134309 (2013.01); H01L 27/1225 (2013.01); H01L 27/322 (2013.01); H01L 27/3246 (2013.01); H01L 27/3262 (2013.01); H01L 29/66742 (2013.01); H01L 29/78696 (2013.01); G02F 2001/13685 (2013.01); G02F 2001/133357 (2013.01);
Abstract

A thin-film transistor is disclosed. The thin-film transistor includes a gate electrode disposed on a substrate, an oxide semiconductor layer disposed so as to overlap at least a portion of the gate electrode in the state of being isolated from the gate electrode, a gate insulation film disposed between the gate electrode and the oxide semiconductor layer, a source electrode connected to the oxide semiconductor layer, and a drain electrode connected to the oxide semiconductor layer in the state of being spaced apart from the source electrode, wherein the oxide semiconductor layer includes indium (In), gallium (Ga), zinc (Zn), tin (Sn), and oxygen (O), the content of indium (In) in the oxide semiconductor layer is greater than the content of gallium (Ga), the content of indium (In) is substantially equal to the content of zinc (Zn), and the content ratio (Sn/In) of tin (Sn) to indium (In) is 0.1 to 0.25.


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