The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Jun. 12, 2018
Applicant:

Sunrise Memory Corporation, Los Gatos, CA (US);

Inventors:

Eli Harari, Saratoga, CA (US);

Raul Adrian Cernea, Santa Clara, CA (US);

Assignee:

SUNRISE MEMORY CORPORATION, Fremont, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11C 16/04 (2006.01); H01L 27/11578 (2017.01); G11C 7/18 (2006.01); H03K 19/20 (2006.01); H03K 19/1776 (2020.01); G11C 16/08 (2006.01); G11C 16/24 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11578 (2013.01); G11C 7/18 (2013.01); G11C 16/0466 (2013.01); G11C 16/08 (2013.01); G11C 16/24 (2013.01); H03K 19/1776 (2013.01); H03K 19/20 (2013.01); H01L 29/78696 (2013.01);
Abstract

A NOR string includes a number of individually addressable thin-film storage transistors sharing a bit line, with the individually addressable thin-film transistors further grouped into a predetermined number of segments. In each segment, the thin-film storage transistors of the segment share a source line segment, which is electrically isolated from other source line segments in the other segments within the NOR string. The NOR string may be formed along an active strip of semiconductor layers provided above and parallel a surface of a semiconductor substrate, with each active strip including first and second semiconductor sublayers of a first conductivity and a third semiconductor sublayer of a second conductivity, wherein the shared bit line and each source line segment are formed in the first and second semiconductor sublayers, respectively.


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