The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Jul. 31, 2017
Canon Kabushiki Kaisha, Tokyo, JP;
Hidemasa Oshige, Yokohama, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A semiconductor device manufacturing method includes forming a first mask over a semiconductor substrate including a first and second surfaces and an electrode provided on the second surface side, forming a first part having tapered shape by etching the semiconductor substrate with the first mask as a mask, forming a second mask covering a side surface of the first part and exposing the bottom surface of the first part, forming a second part reaching the electrode by etching the semiconductor substrate with the second mask as a mask, forming an insulating film covering the side surfaces of the first and second parts, and forming a conductive member connected to the electrode in the first and second parts. A difference between a maximum width and a minimum width of the second part is smaller than a difference between a maximum width and a minimum width of the first part.