The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Nov. 13, 2017
Applicant:

Shanghai Zhaoxin Semiconductor Co., Ltd., Shanghai, CN;

Inventors:

Fuwen Li, Beijing, CN;

Yichen Li, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 5/00 (2006.01); G06T 5/40 (2006.01);
U.S. Cl.
CPC ...
G06T 5/009 (2013.01); G06T 5/40 (2013.01); G06T 2207/20008 (2013.01); G06T 2207/20072 (2013.01);
Abstract

Methods for enhancing image contrast applied to an image processing system are provided. The method includes the steps of: obtaining a first image; generating a first histogram information based on the first image; obtaining, a first parameter and a second parameter of the first image based on the first histogram information, wherein the first parameter is related to the number of homogeneous regions of the first image and the second parameter is related to an average luminance information of the first image; performing a weighted calculation based on the first parameter and the second parameter to determine a restriction parameter; performing a contrast limited histogram equalization processing on the first histogram information using the restriction parameter to generate a second histogram information; and adjusting the first image based on the second histogram information and a mapping curve to generate a second image with contrast enhancement effect.


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