The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Jul. 17, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Michael A. Guillorn, Cold Springs, NY (US);

Kafai Lai, Poughkeepsie, NY (US);

Chi-Chun Liu, Altamont, NY (US);

Ananthan Raghunathan, Wappingers Falls, NY (US);

Hsinyu Tsai, White Plains, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06F 17/5068 (2013.01); G06F 2217/12 (2013.01); H01L 29/66795 (2013.01); Y02P 90/265 (2015.11);
Abstract

A method for reducing chemo-epitaxy directed-self assembly (DSA) defects of a layout of a guiding pattern, the method comprising: inserting a first external dummy along an external edge of the guiding pattern in a vertical direction; and inserting a second external dummy at a fixed distance from a second edge of the first external dummy, wherein the second external dummy includes a two-dimensional shape such that at least two edges of the second external dummy are parallel to the second edge of the first external dummy.


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