The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Mar. 23, 2017
Applicant:

AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;

Inventors:

Megumi Takahashi, Kakegawa, JP;

Daishi Yokoyama, Kakegawa, JP;

Naofumi Yoshida, Kakegawa, JP;

Katsuto Taniguchi, Kakegawa, JP;

Masahiro Kuzawa, Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03F 7/40 (2006.01); G03F 7/075 (2006.01); G03F 7/022 (2006.01); C09D 183/04 (2006.01); C08L 83/04 (2006.01); C08L 101/08 (2006.01); C08L 101/12 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0226 (2013.01); C08L 83/04 (2013.01); C08L 101/08 (2013.01); C08L 101/12 (2013.01); C09D 183/04 (2013.01); G03F 7/022 (2013.01); G03F 7/0233 (2013.01); G03F 7/0757 (2013.01); G03F 7/0758 (2013.01); G03F 7/20 (2013.01); G03F 7/40 (2013.01);
Abstract

[Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.


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