The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Apr. 27, 2018
Applicant:

Olympus Corporation, Hachioji-shi, Tokyo, JP;

Inventor:

Kanako Isono, Tokyo, JP;

Assignee:

OLYMPUS CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/00 (2006.01); G02B 21/02 (2006.01); G02B 27/00 (2006.01); G02B 21/36 (2006.01);
U.S. Cl.
CPC ...
G02B 21/02 (2013.01); G02B 21/365 (2013.01); G02B 27/0068 (2013.01); G02B 21/008 (2013.01); G02B 21/0072 (2013.01);
Abstract

A microscope system includes a microscope apparatus and a controller. The microscope apparatus includes an objective and a correction device that corrects a spherical aberration. The controller, during an interval period of a time-lapse observation, detects a reference target position of an observation target and updates correction information on the basis of at least variation information, the correction information representing a relationship between a position of the objective and a setting of the correction device and the variation information representing a variation amount of a distance from the objective to the reference target position. The controller, during an observation period of the time-lapse observation, controls the correction device in accordance with the correction information for each position of the objective determined on the basis of at least the variation information.


Find Patent Forward Citations

Loading…