The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Jan. 10, 2013
Hanns Wochner, Burghausen, DE;
Robert Baumann, Burghausen, DE;
Hanns Wochner, Burghausen, DE;
Robert Baumann, Burghausen, DE;
WACKER CHEMIE AG, Munich, DE;
Abstract
The invention provides a process for determining surface contamination of polycrystalline silicon, including the steps of: a) providing two polycrystalline silicon rods by deposition in a Siemens reactor; b) determining contaminants in the first of the two rods immediately after the deposition; c) conducting the second rod through one or more systems in which polycrystalline silicon rods are processed further to give rod pieces or polysilicon fragments, optionally cleaned, stored or packed; d) then determining contaminants in the second rod; wherein the difference in the contaminants determined in the first and second rods gives surface contamination of polycrystalline silicon resulting from systems and the system environment.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile