The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Apr. 23, 2018
Duerr Systems Ag, Bietigheim-Bissingen, DE;
Dietmar Wieland, Waiblingen, DE;
Oliver Iglauer, Stuttgart, DE;
Christof Knuesel, Munich, DE;
Marius Winkler, Pleidelsheim, DE;
Duerr Systems AG, Bietigheim-Bissingen, DE;
Abstract
An installation has a process chamber defining an inner space having a tunnel-like form defining a receiving region for workpieces. The process chamber has a portal for the supply or discharge of workpieces and has a device for introducing gaseous fluid into the inner space. The device has a nozzle for producing a fluid stream curtain between the portal and the receiving region. A device supplies fresh air introduced into the receiving region at a side of the fluid stream curtain facing away from the portal. The installation has a pivotable guide contour projecting into the inner space and the nozzle or aperture is in the form of a slot which supplies the gaseous fluid to the inner space via the ceiling with a flow direction oblique relative to the floor. The gaseous fluid supplied via the nozzle to the inner space is guided on the guide contour.