The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10604844 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 31, 2020

Filed:

May. 14, 2018
Applicant:

Purdue Research Foundation, West Lafayette, IN (US);

Inventors:

Zhihong Chen, West Lafayette, IN (US);

Shengjiao Zhang, West Lafayette, IN (US);

Assignee:

Purdue Research Foundation, West Lafayette, IN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01); H01L 21/3213 (2006.01); C23C 16/26 (2006.01); C23C 16/56 (2006.01); C23F 1/14 (2006.01); C23C 14/18 (2006.01); C23C 14/20 (2006.01); C23C 14/58 (2006.01); C23C 14/34 (2006.01); C23C 14/30 (2006.01);
U.S. Cl.
CPC ...
C23C 16/50 (2013.01); C23C 14/18 (2013.01); C23C 14/20 (2013.01); C23C 14/30 (2013.01); C23C 14/34 (2013.01); C23C 14/5806 (2013.01); C23C 16/26 (2013.01); C23C 16/56 (2013.01); C23F 1/14 (2013.01); H01L 21/0262 (2013.01); H01L 21/02491 (2013.01); H01L 21/02527 (2013.01); H01L 21/28568 (2013.01); H01L 21/32136 (2013.01); H01L 21/0242 (2013.01); H01L 21/02422 (2013.01);
Abstract

A method of growing graphene at low temperature on a substrate. The method includes placing a substrate with a layer of cobalt deposited thereon in a plasma enhanced chemical vapor deposition (PECVD) chamber, providing a carbon precursor gas to the PECVD chamber, generating plasma at between about 350° C. and about 800° C. to decompose the carbon precursor gas to thereby deposit carbon atoms on the cobalt layer and enabling a plurality of the carbon atoms to diffuse through the cobalt layer thereby growing graphene on top of the cobalt layer and in between the substrate and the cobalt layer, removing carbon atoms from top of the cobalt layer, and removing the cobalt layer.


Find Patent Forward Citations

Chen, Zhihong. (2020). Graphene production using plasma-enhanced chemical vapor deposition (U.S. Patent No. 10604844). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10604844

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