The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Mar. 20, 2019
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Katsuyoshi Harada, Toyama, JP;

Yushin Takasawa, Toyama, JP;

Satoshi Shimamoto, Toyama, JP;

Shin Sone, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/52 (2006.01); H01L 21/02 (2006.01); H01L 21/31 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45565 (2013.01); C23C 16/455 (2013.01); C23C 16/52 (2013.01); H01L 21/0214 (2013.01); H01L 21/0228 (2013.01); H01L 21/02126 (2013.01); H01L 21/02164 (2013.01); H01L 21/02216 (2013.01); H01L 21/02222 (2013.01); H01L 21/31 (2013.01); H01L 29/66795 (2013.01);
Abstract

There is provided a technique that includes: (a) supplying a hydrogen gas to a substrate set to a first temperature, without supplying any oxygen-containing gas; (b) changing a temperature of the substrate from the first temperature to a second temperature, which is higher than the first temperature, while the hydrogen gas is supplied to the substrate, without supplying any oxygen-containing gas; and (c) forming an oxide film on the substrate, on which (a) and (b) have been performed, by alternately repeating, while the temperature of the substrate is maintained at the second temperature: supplying a precursor gas to the substrate; and supplying an oxygen-containing gas to the substrate, without supplying any hydrogen-containing gas.


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