The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Apr. 19, 2017
Applicant:

Seoul National University R&db Foundation, Seoul, KR;

Inventors:

Ho-Young Kim, Seoul, KR;

Changho Yun, Daejeon, KR;

Dongjo Kim, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 3/00 (2006.01); C01B 32/15 (2017.01); A63C 11/04 (2006.01); C09G 1/08 (2006.01); B82Y 40/00 (2011.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
C09G 3/00 (2013.01); A63C 11/04 (2013.01); C01B 32/15 (2017.08); C09G 1/08 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C01P 2004/64 (2013.01); C01P 2006/90 (2013.01);
Abstract

The present disclosure relates to a ski wax composition including superhydrophobic carbon nano particles (CNPs) and a preparation method thereof, and more particularly, to a ski wax composition including a wax and superhydrophobic CNPs and a preparation method thereof. According to the present invention, since the hydrophobicity and retention capacity of the wax can be increased, friction reducing performance of a ski wax can be increased on an ice surface or a snow surface. In addition, since the superhydrophobic CNPs, which can be easily prepared, are used, the productivity of the ski wax composition can be improved and superb friction reducing performance can be exhibited. Further, since the superhydrophobic CNPs are dispersed into the wax by a simple sonication process, a problem caused by adding a surfactant can be solved. Therefore, the ski wax composition according to the present disclosure can be widely applied to industrial fields associated with the winter sports, including skiing.


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