The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Jun. 20, 2018
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
International Business Machines Corporation, Armonk, NY (US);
Seiichiro Tachibana, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Keisuke Niida, Joetsu, JP;
Hiroko Nagai, Joetsu, JP;
Takashi Sawamura, Joetsu, JP;
Tsutomu Ogihara, Joetsu, JP;
Alexander Edward Hess, San Jose, CA (US);
Gregory Breyta, San Jose, CA (US);
Daniel Paul Sanders, San Jose, CA (US);
Rudy J. Wojtecki, San Jose, CA (US);
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
A compound includes two or more structures shown by the following general formula (1-1) in the molecule, 'Ar' represents an aromatic ring or one that contains at least one nitrogen atom and/or sulfur atom optionally having a substituent, and two Ars are optionally bonded with each other to form a ring structure; the broken line represents a bond with Y; Y represents a divalent or trivalent organic group having 6 to 30 carbon atoms that contains an aromatic ring or a heteroaromatic ring optionally having a substituent, the bonds of which are located in a structure of the aromatic ring or the heteroaromatic ring; R represents a hydrogen atom or a monovalent group having 1 to 68 carbon atoms. This compound can be cured even in an inert gas not only in air atmosphere without forming byproducts, and can form an organic under layer film.