The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Jun. 30, 2016
Applicant:

Korea University Research and Business Foundation, Seoul, KR;

Inventors:

Jong Heun Lee, Seoul, KR;

Yun Chan Kang, Seoul, KR;

Jee-Uk Yoon, Zurich, CH;

Seung Ho Choi, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01G 41/02 (2006.01); C01G 1/02 (2006.01); C01B 13/34 (2006.01); G01N 27/12 (2006.01); G01N 27/40 (2006.01); C01G 19/02 (2006.01);
U.S. Cl.
CPC ...
C01G 41/02 (2013.01); C01B 13/34 (2013.01); C01G 1/02 (2013.01); C01G 19/02 (2013.01); G01N 27/127 (2013.01); G01N 27/40 (2013.01); C01P 2004/03 (2013.01); C01P 2004/04 (2013.01); C01P 2004/62 (2013.01); C01P 2006/12 (2013.01); C01P 2006/16 (2013.01); C01P 2006/17 (2013.01); G01N 27/126 (2013.01);
Abstract

The present invention relates to a porous oxide semiconductor including three-dimensionally interconnected nanopores, mesopores, and macropores, a method for preparing the porous oxide semiconductor, and a gas sensor including the porous oxide semiconductor as a gas sensing material. The nanopores have a diameter of 1 nm to less than 4 nm, the mesopores have a diameter of 4 nm to 50 nm, and the macropores have a diameter of 100 nm to less than 1 μm. The oxide semiconductor gas sensor of the present invention exhibits ultrahigh response and ultrafast response to various analyte gases due to the presence of the controlled nanopores, mesopores, and macropores.


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