The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 31, 2020

Filed:

Nov. 25, 2015
Applicant:

General Electric Company, Schenectady, NY (US);

Inventors:

Yuanfeng Luo, Rexford, NY (US);

Steven Robert Hayashi, Niskayuna, NY (US);

Adegboyega Masud Makinde, Niskayuna, NY (US);

Andrew Lee Trimmer, Niskayuna, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23H 5/08 (2006.01); B23H 9/10 (2006.01); C25F 3/16 (2006.01); C25F 7/00 (2006.01); B24B 31/06 (2006.01);
U.S. Cl.
CPC ...
B23H 5/08 (2013.01); B23H 9/10 (2013.01); B24B 31/06 (2013.01); C25F 3/16 (2013.01); C25F 7/00 (2013.01);
Abstract

The polishing system includes a power supply. The polishing system also includes a container including an interior portion. The interior portion includes a conductive material thereon. The conductive material is electrically coupled to the power supply. The polishing system also includes an electrolytic solution disposed within the container. The electrolytic solution includes a plurality of abrasive particles. The polishing system further includes a flexible media disposed within the container. The container is configured to contain an object. The power supply configured to electrically couple to the object. Each of the electrolytic solution, the flexible media, and the abrasive particles is configured to partially polish the object substantially simultaneously.


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