The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Jul. 07, 2015
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventor:
Michael Schmotzer, Scottsdale, AZ (US);
Assignee:
ASM IP HOLDING B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); H01L 21/67 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); C23C 16/458 (2013.01); C23C 16/4583 (2013.01); C23C 16/4584 (2013.01); C23C 16/4585 (2013.01); C23C 16/4586 (2013.01); H01L 21/6719 (2013.01); H01L 21/68742 (2013.01); H01L 21/68757 (2013.01);
Abstract
A reaction system for processing semiconductor substrates is disclosed. In particular, the invention discloses an arrangement of a susceptor and a baseplate for when a substrate is placed into a reaction region. Magnets are embedded into the susceptor and the baseplate in order to create a gap between the two. As a result of the gap, the invention prevents an accumulation of gaseous materials that would exist in prior art systems as well as particle generation due to physical contact between parts.