The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Oct. 24, 2017
Honeywell International Inc., Morris Plains, NJ (US);
Dorothee De Villele, Haute-Garonne, FR;
Sharanabasappa Advani, Karnataka, IN;
Rajesh Chaubey, Karnataka, IN;
HONEYWELL INTERNATIONAL INC., Morris Plains, NJ (US);
Abstract
An enhanced flight management system and flight management method directed to improved guidance in unstable approach scenarios. The method includes receiving and processing a published arrival procedure (PAP), a published glide path (PGP), landing parameters, and real-time aircraft sensor data to determine a an actual approach profile, and whether the aircraft is following the reference approach profile. Approach stabilization criterion are determined, including, (i) a wind corrected air mass flight path angle (WC FPA) at the IMC; (ii) a vertical speed at the wind corrected air mass flight path angle (VS IMC); (iii) a wind corrected air mass flight path (WC FPA) angle at the VMC; and (iv) a vertical speed at the wind corrected air mass flight path angle (VS VMC). The method also determines whether an IMC criterion profile and a VMC criterion profile stabilizes the actual approach.