The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Jul. 11, 2019
Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;
Shouhong Ding, Shenzhen, CN;
Jilin Li, Shenzhen, CN;
Chengjie Wang, Shenzhen, CN;
Feiyue Huang, Shenzhen, CN;
Yongjian Wu, Shenzhen, CN;
Guofu Tan, Shenzhen, CN;
TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED, Shenzhen, CN;
Abstract
Face model matrix training method, apparatus, and storage medium are provided. The method includes: obtaining a face image library, the face image library including k groups of face images, and each group of face images including at least one face image of at least one person, k>2, and k being an integer; separately parsing each group of the k groups of face images, and calculating a first matrix and a second matrix according to parsing results, the first matrix being an intra-group covariance matrix of facial features of each group of face images, and the second matrix being an inter-group covariance matrix of facial features of the k groups of face images; and training face model matrices according to the first matrix and the second matrix.