The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2020

Filed:

Oct. 16, 2017
Applicant:

Olympus Corporation, Hachioji-shi, Tokyo, JP;

Inventors:

Kenichiro Abe, Tokyo, JP;

Hirokazu Konishi, Tokyo, JP;

Masahiro Sakakura, Tokyo, JP;

Takashi Kasahara, Tokyo, JP;

Yuso Fujita, Tokyo, JP;

Assignee:

OLMYPUS CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/02 (2006.01); G02B 9/18 (2006.01);
U.S. Cl.
CPC ...
G02B 21/025 (2013.01); G02B 9/18 (2013.01); G02B 21/02 (2013.01);
Abstract

An objective includes a first lens group that has a positive refractive power and a second lens group that has a negative refractive power. The objective includes a first negative lens and satisfies0.005≤≤0.1  (1)0.005≤≤0.72  (2)10 mm≤≤100 mm  (3)0.1≤≤31  (4)when dis a thickness of the first negative lens, his an axial marginal ray height on a lens surface on the object side of the first negative lens, his a minimum value of an axial marginal ray height in the second lens group, his a height of an axial marginal ray on a lens surface of the objective that is situated closest to the image side, L is a length of the objective, and f is a focal length of the objective.


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