The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2020

Filed:

Sep. 07, 2016
Applicant:

Halliburton Energy Services, Inc., Houston, TX (US);

Inventors:

Yinghui Lu, The Woodlands, TX (US);

Chung Chang, Houston, TX (US);

Mark V. Collins, Spring, TX (US);

Srinivasan Jagannathan, Houston, TX (US);

Yibing Zheng, Houston, TX (US);

Avinash Vinayak Taware, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 29/04 (2006.01); G01N 29/34 (2006.01); G01M 3/24 (2006.01); G01N 29/42 (2006.01); G01N 29/46 (2006.01); G01N 29/036 (2006.01); G01N 29/44 (2006.01); G01N 29/14 (2006.01); E21B 47/10 (2012.01); G01N 29/22 (2006.01);
U.S. Cl.
CPC ...
G01M 3/246 (2013.01); E21B 47/101 (2013.01); G01M 3/243 (2013.01); G01N 29/036 (2013.01); G01N 29/14 (2013.01); G01N 29/223 (2013.01); G01N 29/42 (2013.01); G01N 29/4472 (2013.01); G01N 29/46 (2013.01); G01N 2291/106 (2013.01);
Abstract

A method for operation of an acoustic tool, having a plurality of acoustic sensors, may include receiving acoustic waves from an acoustic source located at a depth in a borehole. A selected location (e.g., central location) of the acoustic sensor array may be positioned substantially at the depth of the acoustic source based on a symmetricity of an upper and lower section of a frequency-wavenumber (f-k) transform pattern with respect to a selected wavenumber. A radial distance from the acoustic source to the acoustic tool may be determined based on a theoretical f-k transform pattern used as a mask to filter measured data in the f-k domain.


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