The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2020

Filed:

Aug. 21, 2018
Applicants:

Aaron Reinicker, Buffalo, NY (US);

Ashwini K Sinha, East Amherst, NY (US);

Douglas C Heiderman, Akron, NY (US);

Inventors:

Aaron Reinicker, Buffalo, NY (US);

Ashwini K Sinha, East Amherst, NY (US);

Douglas C Heiderman, Akron, NY (US);

Assignee:

Praxair Technology, Inc., Danbury, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/48 (2006.01); H01J 37/08 (2006.01); H01J 37/317 (2006.01); C23C 14/14 (2006.01); H01J 37/32 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
C23C 14/48 (2013.01); C23C 14/14 (2013.01); H01J 37/08 (2013.01); H01J 37/3171 (2013.01); H01J 37/32412 (2013.01); H01L 21/26513 (2013.01); H01J 2237/022 (2013.01); H01J 2237/06 (2013.01); H01L 21/265 (2013.01);
Abstract

A novel method, composition and system for using antimony-containing dopant materials are provided. The composition is selected with sufficient vapor pressure to flow into an arc chamber as part of an ion implant process. The antimony-containing material is represented by a non-carbon containing chemical formula, thereby reducing or eliminating the introduction of carbon-based deposits into the ion chamber. The composition is stored in a storage and delivery vessel under stable conditions, which includes a moisture-free environment that does not contain trace amounts of moisture.


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