The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Feb. 28, 2018
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Hans-Juergen Eickelmann, Mainz, DE;
Thorsten Muehge, Mainz, DE;
Erik Rueger, Mainz, DE;
Markus Schmidt, Mainz, DE;
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/54 (2006.01); C23C 14/02 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3464 (2013.01); C23C 14/027 (2013.01); C23C 14/3407 (2013.01); C23C 14/3492 (2013.01); C23C 14/54 (2013.01); C23C 14/542 (2013.01); C23C 14/545 (2013.01); C23C 14/548 (2013.01); H01J 37/32935 (2013.01); H01J 37/3429 (2013.01); H01J 37/3473 (2013.01);
Abstract
Embodiments relate to a sputter chamber with a configurable surface in communication with a target material. A control system is in communication with the chamber and functions to prepare an alloy film by changing a composition of the configurable surface. As ingress gas is introduced to the chamber to interact with the changed composition, the interaction causes a reaction that produces an alloy film.