The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Oct. 06, 2015
Applicant:
Bridgestone Corporation, Chuo-ku, Tokyo, JP;
Inventor:
Sotaro Iwabuchi, Tokyo, JP;
Assignee:
BRIDGESTONE CORPORATION, Chuo-ku, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B60C 13/02 (2006.01); B60C 13/00 (2006.01); B60C 11/03 (2006.01); B60C 11/16 (2006.01); B60C 1/00 (2006.01); B60C 9/18 (2006.01); B60C 11/13 (2006.01);
U.S. Cl.
CPC ...
B60C 13/001 (2013.01); B60C 11/03 (2013.01); B60C 11/1656 (2013.01); B60C 13/00 (2013.01); B60C 13/002 (2013.01); B60C 13/02 (2013.01); B60C 1/0025 (2013.01); B60C 9/18 (2013.01); B60C 13/003 (2013.01); B60C 2011/0346 (2013.01); B60C 2011/1361 (2013.01);
Abstract
First direction ridge patterns and second direction ridge patterns are lined-up alternately at a decorative concave portion. Plural main ridgesA throughD and sub-ridgesA throughD, which project-out from a bottom surfaceA, are formed at a first direction ridge pattern. The respective ridges are disposed in parallel such that ridge extending directions are a same direction. Light reflection patterns are different at a main ridge regionand a sub-ridge region