The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Oct. 17, 2017
The Regents of the University of California, Oakland, CA (US);
Mihaela Balu, Irvine, CA (US);
Eric O. Potma, Irvine, CA (US);
Bruce J. Tromberg, Irvine, CA (US);
Hideharu Mikami, Tokyo, JP;
The Regents of the University of California, Oakland, CA (US);
Abstract
A multiphoton microscope based on two-photon excited fluorescence and second-harmonic generation that images FOVs of about 0.8 mm(without stitching adjacent FOVs) at speeds of 10 frames/second (800×800 pixels) with lateral and axial resolutions of 0.5 μm and 2.5 μm, respectively. The scan head of the instrument includes a fast galvanometric scanner, relay optics, a beam expander and a high NA objective lens. The system is based on a 25×, 1.05 NA water immersion lens, which features a long working distance of 1 mm. A proper tailoring of the beam expander, which consists of the scan and tube lens elements, enables scaling of the FOV. The system and method also include a flat wavefront of the beam, minimum field curvature, and suppressed spherical aberrations. All aberrations in focus are below the Marechal criterion of 0.07λ rms for diffraction-limited performance.