The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2020
Filed:
Aug. 19, 2015
Applicant:
Washington University, St. Louis, MO (US);
Inventors:
Tandeep Singh Chadha, St. Louis, MO (US);
Pratim Biswas, St. Louis, MO (US);
Woo-Jin An, St. Louis, MO (US);
Assignee:
Washington University, St. Louis, MO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 4/04 (2006.01); C01G 19/02 (2006.01); C23C 16/455 (2006.01); C01G 1/02 (2006.01); C23C 16/40 (2006.01); C01G 23/07 (2006.01); H01M 4/1391 (2010.01); H01M 10/0525 (2010.01); H01M 10/054 (2010.01); H01M 4/485 (2010.01);
U.S. Cl.
CPC ...
H01M 4/0428 (2013.01); C01G 1/02 (2013.01); C01G 19/02 (2013.01); C01G 23/07 (2013.01); C23C 16/405 (2013.01); C23C 16/4551 (2013.01); H01M 4/1391 (2013.01); C01P 2002/04 (2013.01); C01P 2002/54 (2013.01); C01P 2002/72 (2013.01); C01P 2002/85 (2013.01); C01P 2004/03 (2013.01); C01P 2004/16 (2013.01); C01P 2006/40 (2013.01); H01M 4/485 (2013.01); H01M 10/054 (2013.01); H01M 10/0525 (2013.01);
Abstract
The present disclosure is generally directed to a single-step synthesis of nanostructured thin films by a chemical vapor and aerosol deposition (CVAD) process. The present disclosure is also directed to methods for controlling the morphology of the nanostructured thin films. The films can be used, for example, in lithium ion and/or sodium ion battery electrodes, solar cells and gas sensors.
Quick Actions:
Chadha, Tandeep. (2020). Single-step synthesis of nanostructured thin films by a chemical vapor and aerosol deposition process (U.S. Patent No. 10593928). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10593928
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile