The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2020
Filed:
Jan. 29, 2019
Applicant:
Arm Limited, Cambridge, GB;
Inventors:
Carlos Alberto Paz de Araujo, Colorado Springs, CO (US);
Jolanta Bozena Celinska, Colorado Springs, CO (US);
Lucian Shifren, San Jose, CA (US);
Assignee:
Arm Limited, Cambridge, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 45/00 (2006.01); H01L 49/00 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 49/003 (2013.01); H01L 45/04 (2013.01); H01L 45/146 (2013.01); H01L 45/1616 (2013.01); H01L 45/1641 (2013.01); H01L 49/02 (2013.01);
Abstract
Disclosed is a method for the manufacture of a CEM device comprising forming a thin film of a correlated electron material having a predetermined electrical impedance when the CEM device in its relatively conductive (low impedance) state, wherein the forming of the CEM thin film comprises forming a d- or f-block metal or metal compound doped by a physical or chemical vapour deposition with a predetermined amount of a dopant comprising a back-donating ligand for the metal.