The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2020
Filed:
Mar. 16, 2018
Applicant:
Sandisk Technologies Llc, Plano, TX (US);
Inventors:
Keisuke Izumi, Yokkaichi, JP;
Naomi Matsuda, Yokkaichi, JP;
Assignee:
SANDISK TECHNOLOGIES LLC, Addison, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); B24B 37/015 (2012.01); H01L 21/321 (2006.01); B24B 37/04 (2012.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 22/26 (2013.01); B24B 37/015 (2013.01); B24B 37/042 (2013.01); H01L 21/3212 (2013.01); H01L 21/7684 (2013.01);
Abstract
A chemical mechanical polishing apparatus includes a liquid filled bladder that exerts force on the back of the substrate being polished. The bladder can be a multi-chamber bladder having chambers filled with different ratios of hot and cold water. Eddy current detection during the polishing can be used to control the polishing process parameters.